Multilayer dielectric substrate and semiconductor package

ABSTRACT

A multilayer dielectric substrate that mounts a semiconductor device in a cavity formed on a substrate. The multilayer dielectric substrate includes an opening formed in a surface-layer grounding conductor on the substrate in the cavity, and an impedance transformer, with a length of about ¼ of an in-substrate effective wavelength of a signal wave, electrically connected through the opening to the cavity. The multilayer dielectric substrate further includes a short-circuited end dielectric transmission line with a length of about ¼ of the in-substrate effective wavelength of the signal wave, a coupling opening formed on an inner-layer grounding conductor in a connecting section of the impedance transformer and the dielectric transmission line, and a resistor formed in the coupling opening.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. application Ser. No.11/630,996, filed Dec. 28, 2006, the entire contents of which areincorporated herein by reference. U.S. application Ser. No. 11/630,996is a National Stage of PCT/JP05/011650 filed Jun. 24, 2005, and claimsthe benefit of priority of Japanese Application No. 2004-190316 filedJun. 28, 2004.

TECHNICAL FIELD

The present invention relates to a multilayer dielectric substrate and asemiconductor package that includes an electromagnetically shieldedspace (hereinafter, “cavity”) for mounting a semiconductor device, whichoperates in a high-frequency band such as a microwave band or amillimeter-wave band, formed on a dielectric substrate.

BACKGROUND ART

In a high-frequency package mounted with a high-frequency semiconductordevice, which operates in a high-frequency band such as a microwave bandor a millimeter-wave band, in consideration of environmental resistanceand operation stability of the high-frequency package, thehigh-frequency semiconductor device is often mounted in a cavityhermetically and electrically shielded by a cover, a seal ring, or agrounding conductor.

However, resonance occurs in a frequency band with a cavity dimension,which depends on a member such as the cover, about a half or an integertimes as long as that of a free-space propagation wavelength. As aresult, an operation of the semiconductor device in the cavity and acharacteristic of a transmission line become unstable. Particularly, ina high-frequency semiconductor device that operates in a millimeter-waveband (30 gigahertz to 300 gigahertz), a dimension of the device and thatof a propagation wavelength corresponding to a signal frequency comeclose to each other. Thus, it is difficult to make a dimension of thecavity for housing the device a half or less of the propagationwavelength corresponding to the signal frequency. Consequently, ahigh-order resonance mode tends to occur. In particular, in amillimeter-wave radar that operates in a 76-GHz band, a free-spacepropagation wavelength is about 4 millimeters in this frequency band anda size of a cavity necessary for mounting a plurality of high-frequencycircuits with a size of 1 millimeter square to 3 millimeters square isabout 10 millimeters. Thus, cavity resonance is likely to occur.

To control such cavity resonance, Patent Document 1 discloses aconventional technology for forming a radio wave absorbent and aresistor film in a region inside a cavity such as a rear surface of acover.

Patent Document 1: Japanese Patent Application Laid-open No. H8-18310

DISCLOSURE OF INVENTION Problem to be Solved by the Invention

In the conventional technology, a dedicated cover bonded with a radiowave absorbent and a resistor is required, which necessitates secondaryassembly work of bonding the resistor to the cover. Thus, the number ofmanufacturing steps increases, resulting in an increase in manufacturingcost. Further, the resistor applied to the entire cover increasesmaterial cost of the resistor. Besides, it is likely that an inert gas,which contaminates and erodes the high-frequency device, is generatedfrom an adhesive for bonding the radio wave absorbent and the resistorto the rear surface of the cover. Moreover, the resistor is arrangedvertically to an electric field in the cavity, and efficiency ofabsorption of electromagnetic waves is low.

It is therefore an object of the present invention to provide amultilayer dielectric substrate and a semiconductor package at low costthat improves efficiency of absorption of electromagnetic waves tocontrol cavity resonance in a hermetic package as well as simplifying amanufacturing process.

Means for Solving Problem

To overcome the problems and achieve the object mentioned above,according to the first aspect of the present invention, a multilayerdielectric substrate in which a cavity is formed on a dielectricsubstrate and a semiconductor device is mounted in the cavity, includesan opening formed in a surface-layer grounding conductor arranged on thedielectric substrate in the cavity, an impedance transformer formed inthe dielectric substrate, electrically coupled with the cavity via theopening, and having a length an odd number times as long as about ¼ ofan in-substrate effective wavelength of a signal wave, ashort-circuited-end dielectric transmission line formed in thedielectric substrate and having a length an odd number times as long asabout ¼ of the in-substrate effective wavelength of the signal wave, acoupling opening formed in an inner-layer grounding conductor in aconnecting section of the impedance transformer and the dielectrictransmission line, and a resistor formed in the coupling opening.

According to the first aspect of the present invention, a stateequivalent to an open state without a cover is simulatively created byforming a terminating waveguide, which is coupled with a cavity, tosuppress cavity resonance. That is, an opening (removed part of asurface-layer grounding conductor) is formed at a cavity end of asurface-layer grounding conductor on a dielectric substrate or theperiphery of the end. An impedance transformer with a length an oddnumber times as long as about ¼ of an in-substrate effective wavelengthλg of a signal wave is formed in the dielectric substrate beyond thisopening. A coupling opening is formed on an inner-layer groundingconductor at the tip of the impedance transformer, i.e., at a positiondistant from the opening by a length an odd number times as long asabout λg/4 in a thickness direction of the substrate. A resistor(printed resistor) is formed to cover the coupling opening. Acharacteristic impedance of the impedance transformer is set to a valuethat converts impedance of the resistor and the cavity. Ashort-circuited-end dielectric transmission line having a length an oddnumber times as long as about ¼ of the in-substrate effective wavelengthλg of the signal wave is formed in the coupling opening, i.e., beyondthe resistor. An electric field distribution in the coupling opening isopen according to a short-circuit load condition of the dielectrictransmission line. The resistor is arranged at the maximum point of theelectric field in parallel to an electric field direction.

According to the second aspect of the present invention, a multilayerdielectric substrate in which a cavity is formed on a dielectricsubstrate and a semiconductor device is mounted in the cavity, includesan opening formed at a cavity end of a surface-layer grounding conductoron a dielectric substrate in the cavity or the periphery of the end, ashort-circuited-end dielectric transmission line formed in thedielectric substrate, electrically coupled with the cavity via theopening, and having a length an odd number times as long as about ¼ ofan in-substrate effective wavelength of a signal wave, and a resistorformed in the opening.

According to the second aspect of the present invention, a stateequivalent to an open cavity state is simulatively created by forming aterminating waveguide, which is coupled with a cavity, to suppresscavity resonance. That is, an opening (removed part of a surface-layergrounding conductor) is formed at a cavity end of a surface-layergrounding conductor on a dielectric substrate or the periphery of theend. A short-circuited-end dielectric transmission line with a length anodd number times as long as about ¼ of an in-substrate effectivewavelength of a signal wave, which is electrically coupled with thecavity, is formed in a dielectric substrate beyond the opening. Anelectric field distribution in the opening is open according to ashort-circuit load condition of the dielectric transmission line. Theresistor is arranged at the maximum point of the electric field inparallel to an electric field direction.

Effect of the Invention

According to the first aspect of the present invention, it is possibleto realize, with the impedance transformer, impedance transformationwith less reflection from the cavity, i.e., a hollow waveguide, to aresistance load. An electric field in the coupling opening is maximized(brought to an open point) by the short-circuited-end dielectrictransmission line. Thus, it is possible to obtain maximum attenuationand absorption effects from the resistor with respect to the signalfrequency band. With the terminating conditions, it is possible toreliably control cavity resonance and achieve stable operations of asemiconductor device and a transmission line. Besides, the opening, thedielectric transmission line, and the resistor can be formed togetherduring the manufacture of the multilayer dielectric substrate, whicheliminates the need for secondary assembly work. Thus, it is possible tosimplify manufacturing process, resulting in less cost. Moreover, anadhesive is not used in arranging the resistor, an inert gas, whichcontaminates and erodes a high-frequency device, is not generated.

According to the second aspect of the present invention, an electricfield in the coupling opening is maximized (brought to an open point) bythe short-circuited-end dielectric transmission line. Thus, it ispossible to obtain maximum attenuation and absorption effects from theresistor with respect to the signal frequency band. Therefore, it ispossible to control cavity resonance and achieve stable operations of asemiconductor device and a transmission line.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a perspective view of an external appearance of asemiconductor package (high-frequency package) according to the presentinvention.

FIG. 2 is a perspective view of an external appearance of thesemiconductor package with a cover removed.

FIG. 3 is a plan view of an internal structure of the semiconductorpackage.

FIG. 4 is a detailed sectional view of an internal layer structure of amultilayer dielectric substrate of a semiconductor package according toa first embodiment of the present invention.

FIG. 5 is a sectional view of the internal layer structure of themultilayer dielectric substrate shown in FIG. 4 with an electric fielddistribution.

FIG. 6 is a diagram of an equivalent circuit of a resonance suppressingcircuit.

FIG. 7A is a plan view of details of a part in the multilayer dielectricsubstrate and is a diagram of a state of a surface A of the multilayerdielectric substrate shown in FIG. 4.

FIG. 7B is a plan view of details of a part in the multilayer dielectricsubstrate and is a diagram of a surface structure of the multilayerdielectric substrate shown in FIG. 4.

FIG. 7C is a plan view of details of a region corresponding to a sectionF in FIG. 7A and is a diagram of a surface structure of the multilayerdielectric substrate shown in FIG. 4.

FIG. 7D is a plan view of details of the region corresponding to thesection F in FIG. 7A and is a diagram of a state of a surface C of themultilayer dielectric substrate shown in FIG. 4.

FIG. 7E is a plan view of details of the region corresponding to thesection F in FIG. 7A and is a diagram of a state of the surface A of themultilayer dielectric substrate shown in FIG. 4.

FIG. 7F is a plan view of details of a part in the multilayer dielectricsubstrate and is a diagram of another example of the surface structureof the multilayer dielectric substrate shown in FIG. 4.

FIG. 8 is a graph of transmission characteristics in a cavity of thesemiconductor package according to the first embodiment.

FIG. 9 is a detailed sectional view of an internal layer structure of amultilayer dielectric substrate of a semiconductor package according toa second embodiment of the present invention.

FIG. 10 is a detailed sectional view of an internal layer structure of amultilayer dielectric substrate of a semiconductor package according toa third embodiment of the present invention.

EXPLANATIONS OF LETTERS OR NUMERALS

1 High-frequency package (Semiconductor package)

2 Multilayer dielectric substrate

3 High-frequency device (Semiconductor device)

4 Seal ring

5 Cover

6 IC mounting recess

6 a Sidewall

7 Feed-through

8 Microstrip line

10 Inner conductor pad

11 Conductor pad

12 Wire

15 External conductor pad

16 Ground surface (Surface-layer grounding conductor)

18 Ground pattern (Surface-layer grounding conductor)

19 Dielectric

30 Ground via

30 b Sidewall ground via

33 Cavity

35 Inner-layer grounding conductor

40 Signal via

45 Inner-layer signal line

50 Opening

60 Impedance transformer

65 Coupling opening

70 Resistor

80 Dielectric transmission line

300 Resistor via array

BEST MODE(S) FOR CARRYING OUT THE INVENTION

Embodiments of a multilayer dielectric substrate and a semiconductorpackage according to the present invention are explained in detail belowwith reference to the accompanying drawings. However, the presentinvention is not limited to the embodiments.

First Embodiment

FIGS. 1 to 3 are diagrams of a semiconductor package 1 according to thepresent invention. The present invention is applicable to asemiconductor package mounted with a semiconductor device (semiconductorIC) that operates in an arbitrary frequency band. In the followingdescription, the present invention is applied to the semiconductorpackage 1 (hereinafter, “high-frequency package”) mounted with aplurality of high-frequency semiconductor devices (monolithic microwaveintegrated circuit (MMIC), hereinafter, “high-frequency device”) thatoperate in a high frequency band such as a microwave band or amillimeter-wave band. In the semiconductor package 1, a hermetically andelectrically shielded cavity is formed on a dielectric substrate. Amultilayer dielectric substrate 2 mounted with a semiconductor device isprovided in the cavity. The semiconductor package 1 is suitably appliedto, for example, a frequency-modulation continuous-wave (FM-CW) radar.

In the high-frequency package 1 shown in FIGS. 1 to 3, a frame-shapedseal ring 4 of metal is bonded on the multilayer dielectric substrate 2by a brazing material such as solder or silver solder. A cover 5 servingas a lid is welded on the seal ring 4. In an example of FIG. 1, the sealring 4 is a frame of a figure-eight-like shape with two through-holes 4a and 4 b.

By bonding the cover 5 to the seal ring 4, a plurality of high-frequencydevices 3 on the multilayer dielectric substrate 2 are hermeticallysealed. The seal ring 4 and the cover 5 shield unnecessary radiationfrom the high-frequency devices 3 on the multilayer dielectric substrate2 to the outside. In other words, the seal ring 4 and the cover 5constitute an electromagnetic shielding member that covers a part of asurface layer of the multilayer dielectric substrate 2 and thehigh-frequency devices 3. A structure of the electromagnetic shield isnot limited to this. The electromagnetic shield includes variouscomponents such as a grounding conductor and a plurality of groundedvias, described later, provided on the surface and inner layers of themultilayer dielectric substrate 2.

As shown in FIGS. 2 and 3, one to a plurality of recesses (hereinafter,“IC mounting recesses”) 6 for mounting the high-frequency devices 3 areformed on the multilayer dielectric substrate 2. The IC mounting recessforms a hollowed out section in upper layers (first and second layers inan example of the figures) of the multilayer dielectric substrate 2. Thehollowed out section is surrounded by a sidewall 6 a of the IC mountingrecess 6. A grounding conductor 16 is formed on a bottom surface of theIC mounting recess (bottom surface of the hollowed out section). Thehigh-frequency devices 3 are housed in the IC mounting recess 6. Thehigh-frequency devices 3 are bonded to the grounding conductor 16 by abonding material (not shown) such as solder or brazing material.

As shown in FIG. 3, the IC mounting recesses 6 are arranged inside thetwo through-holes 4 a and 4 b of the seal ring 4, respectively. Afeed-through 7 is provided below a seal ring 4′ that defines the twothrough-holes 4 a and 4 b of the seal ring 4. The high-frequency devices3 in the IC mounting recess 6 on the upper side and the high-frequencydevices 3 in the IC mounting recess 6 on the lower side are connected bythe feed-through 7 and a microstrip line 8. The feed-through 7 is formedto cover a signal pin or the microstrip line with a dielectric.Consequently, a high-frequency signal is transmitted between the two ICmounting recesses 6 while a hermetic state is maintained in therespective IC mounting recesses 6. The microstrip line 8 is arranged onthe surface layer of the multilayer dielectric substrate 2 and connectedto the feed-through 7. A conductor pad in the high-frequency device 3and the microstrip line 8 are wire-bonded by a wire 1200.

Grounding conductors 18 on the surface layer of the multilayerdielectric substrate 2 are connected to the grounding conductor 16 onthe semiconductor device mounting surface by a plurality of ground vias(sidewall ground vias) 30 a and 30 b formed around the IC mountingrecess 6 in the multilayer dielectric substrate 2. The groundingconductors 18 have the same potential as that of the grounding conductor16. The ground vias 30 a and 30 b surround conductor pads 10 (describedlater). Other ground vias (sidewall ground vias) 30, described laterreferring to FIG. 6, are arranged along the inner circumferentialsurface of the two through-holes 4 a and 4 b of the seal ring 4. Theground vias 30 are connected to the grounding conductors 18 and have thesame potential as that of the grounding conductors 18.

Spacing between these sidewall ground vias 30 a, 30 b, and 30 is set toa value smaller than a half of an in-substrate effective wavelength λgof a high-frequency signal, which is an unnecessary wave, used in thehigh-frequency package 1. Consequently, the unnecessary wave isprevented from entering the multilayer dielectric substrate 2 via thesidewall 6 a of the IC mounting recess 6, and an electromagnetic shieldis three-dimensionally formed by the seal ring 4 and the cover 5.

The conductor pads (hereinafter, “inner conductor pads”) 10 are providedon the surface layer of the multilayer dielectric substrate 2 inside theseal ring 4 for supplying a DC bias voltage to the high-frequencydevices 3 or inputting and outputting a control signal (low-frequencysignal close to a DC region) and an IF signal (signal in an intermediatefrequency band) to and from the high-frequency devices 3. The DC biasvoltage, the control signal, and the IF signal are hereinafter generallyreferred to as “driving control signal” for the high-frequency devices3. Driving-control-signal input/output pads 11 (hereinafter, “conductorpads”) are also provided on the high-frequency device 3 side. The innerconductor pad 10 and the conductor pad 11 are wire-bonded by a wire 12of gold or the like. A metal bump or a ribbon can be used instead of thewires 12.

A plurality of conductor pads (hereinafter, “external conductor pads”)15 are provided as external terminals on the multilayer dielectricsubstrate 2 outside the seal ring 4. The external conductor pads 15 areDC-connected to the inner conductor pads 10 via signal vias (signalthrough-holes) and an inner-layer signal line, described later, formedin the multilayer dielectric substrate 2. These external conductor pads15 are connected to a power source circuit board, a control board andthe like, which are not shown in the figures, via wires or the like.

FIG. 4 is a diagram of a via structure (through-hole structure) in themultilayer dielectric substrate 2 of the high-frequency package 1. InFIG. 4, vias for driving control signals (hereinafter, “signal vias”)40, to which driving control signals such as a control signal, aninterface signal, and a DC bias voltage are transmitted, are indicatedby outline without fill patterns and the ground vias 30, 30 a, and 30 bare indicated by hatching.

In this case, the multilayer dielectric substrate 2 has a five-layerstructure including first to fifth layers. The center of the first andthe second layers of the multilayer dielectric substrate 2 is removed toform the IC mounting recess 6. The ground surface 16 serving as asurface-layer grounding conductor is formed on the bottom surface of theIC mounting recess 6, i.e., the surface of the third layer. Thehigh-frequency devices 3 are mounted on the ground surface 16.

As described above, the seal ring 4 is mounted on the multilayerdielectric substrate 2. The cover 5 serving as a lid is provided on theseal ring 4. The seal ring 4 and the cover 5 have the same potential asthat of the surface-layer grounding conductors 16 and 18. A hermeticcavity 33 is formed by the seal ring 4 and the cover 5 around thehigh-frequency devices 3 on the multilayer dielectric substrate 2. Thecavity 33 is electrically shielded from the outside by theelectromagnetic shielding members such as the seal ring 4 and the cover5, the surface-layer grounding conductors such as the ground surface 16and ground pattern 18, and the sidewall ground vias 30 a, 30 b, and 30.Instead of the sidewall ground vias 30 a and 30 b, the sidewall 6 a ofthe IC mounting recess 6 can be metallized to form a ground surface onthe sidewall 6 a.

The ground vias 30, 30 a, and 30 b are appropriately connected to thesurface-layer grounding conductors 18, a grounding member (not shown)arranged below the multilayer dielectric substrate 2, or inner-layergrounding conductors 35 formed on inner layers of the multilayerdielectric substrate 2. The inner-layer grounding conductors 35 arebasically provided individually among all the layers as solid groundlayers. The inner conductor pad 10 inside the seal ring 4 is connectedto the external conductor pads 15 (not shown in FIG. 4) arranged outsidethe seal ring 4 via one to a plurality of the signal vias 40 and one toa plurality of inner-layer signal lines 45. Although not clearly shownin FIG. 4, the ground vias 30 are arranged around the signal via 40 andthe inner-layer signal line 45 with a dielectric therebetween. Shield bythe ground vias 30 and the inner-layer grounding conductors 35suppresses radiation of unnecessary waves from the signal vias 40 andthe inner-layer signal lines 45 and coupling of unnecessary waves fromthe surroundings.

A main part of the first embodiment is explained. In the firstembodiment, a cavity-resonance control circuit that includes an opening50, an impedance transformer 60, a coupling opening 65, ashort-circuited-end dielectric transmission line 80, and a resistor 70is formed in the multilayer dielectric substrate 2.

The opening 50, i.e., a pattern removed from a ground, is formed at acavity end of the ground pattern 18 as a surface-layer groundingconductor on the surface (the first layer) of the multilayer dielectricsubstrate 2 or the periphery of the end. The impedance transformer 60with a length about ¼ of an in-substrate effective wavelength λg of asignal wave, which is electrically coupled to the cavity 33 (i.e., ahollow waveguide) via the opening 50, is formed in the multilayerdielectric substrate 2 beyond the opening 50. The impedance transformer60 includes the inner-layer grounding conductor 35, the ground via 30,and the dielectrics in the inner-layer grounding conductor 35 and theground via 30.

The coupling opening 65, i.e., a pattern removed from a ground, isformed in the inner-layer grounding conductor 35 arranged at a positiondistant from the opening 50 by a length of about λg/4 in the thicknessdirection of the substrate. The resistor (printed resistor) 70 is formedto cover the coupling opening 65. The short-circuited-end dielectrictransmission line 80 with a length about ¼ of the in-substrate effectivewavelength λg of a signal wave is formed beyond the coupling opening 65.The dielectric transmission line 80 includes the inner-layer groundingconductor 35, the ground vias 30 and 30 d, and dielectrics in theinner-layer grounding conductor 35 and the ground vias 30. Thedielectric transmission line 80 functions as a dielectric waveguidehaving a short-circuited surface (surface on which the ground via 30 dis arranged) at the end thereof. The length of about λg/4 in thedielectric transmission line 80 is, as shown in FIG. 5, a distance L2from the short-circuited-end ground via 30 d to the coupling opening 65.The length of about λg/4 of the impedance transformer 60 is, as shown inFIG. 5, a distance L1 from the opening 50 to the coupling opening 65.FIG. 5 depicts the same structure as that of FIG. 4, and referencenumerals are omitted except those necessary for explanation.

On the other hand, when stable operations of a semiconductor device anda transmission line are considered, a state in which the cover 5 isremoved (open state) is ideal because there is no unnecessary resonancein the cavity. In the first embodiment, the opening 50 is formed at thecavity end of the ground pattern 18 or the periphery of the end. Theimpedance transformer 60 and the resistor 70 are connected to themultilayer dielectric substrate 2 beyond the opening 50. It isimpossible to realize an open end in the waveguide, and therefore, thedielectric transmission line 80 is connected to the impedancetransformer 60 and the resistor 70 is provided in the position aboutλg/4 from the end short-circuited point of the dielectric transmissionline 80, i.e., in the coupling opening 65, which connects the impedancetransformer 60 and the dielectric transmission line 80. In other words,the position about λg/4 from the end short-circuited point of thedielectric transmission line 80 is, for the signal wave with thein-substrate effective wavelength λg, an open point where an electricfield is maximized. The resistor 70 is provided in the open point. Withthis constitution, the multilayer dielectric substrate 2 can operate asa terminator that efficiently attenuates and absorbs radio waves in thesignal frequency band and control cavity resonance to achieve stableoperations of a semiconductor device and a transmission line.

An electric field distribution formed in the cavity 33, the impedancetransformers 60, and the dielectric transmission lines 80 is asindicated by arrows in FIG. 5. In FIG. 5, the resistor 70 is arranged inparallel to an electric field surface formed in the coupling opening 65.Therefore, it is possible to efficiently attenuate and absorb radiowaves compared to the conventional technology in which a resistor isarranged perpendicular to an electric filed formed in a cavity.

An equivalent circuit of a resonance suppressing circuit is explainedwith reference to FIG. 6. As a characteristic impedance Z2 of theimpedance transformer 60 is selected a (impedance match) value thatsatisfies Z2=(Z0·R)^(1/2) where Z0 is a characteristic impedance of thecavity 33 and R is a resistance of the resistor 70. When the impedancetransformer 60 as above is inserted, it is possible to improve areflection characteristic, i.e., attenuation and absorption effects bythe resistor 70, compared to the case that the resistor 70 is directlyprovided in the opening 50 on the cavity 33 side.

A characteristic impedance Z1 of the dielectric transmission line 80 is,desirably but not necessarily, coincide with a terminating impedance Rof a resistor; an open condition in the coupling opening 65 only has tobe fulfilled. In the reflection characteristic of the resonancesuppressing circuit, a reactance component of a high-order mode isgenerated by a dielectric constant difference between the cavity 33 (thehollow waveguide) and the impedance transformer 60 (the dielectrictransmission line) and the impedance match state changes. To solve thisproblem, an iris (inductivity, capacitivity) or the like for cancelingreactance can be set in the inner-layer grounding conductor 35constituting the impedance transformer 60. Further, to cancel thereactance, the characteristic impedance Z2 and the effective length L1of the impedance transformer 60 can be corrected to improve thereflection characteristic of the entire resonance suppressing circuit.

FIGS. 7A to 7F are plan views of the coupling opening 65 and theresistor 70 formed in the multilayer dielectric substrate 2 shown inFIG. 4. FIG. 7A is a plan view of a state of a part of a surface A(corresponding to a surface A in FIG. 4; a fourth layer pattern andfourth layer vias) of the multilayer dielectric substrate 2. Inparticular, FIG. 7A depicts details of a section E shown in FIG. 3. FIG.7B is a plan view of an example of a surface structure (corresponding toa surface D in FIG. 4) in the cavity 33 of the multilayer dielectricsubstrate 2. In particular, FIG. 7B depicts details of the section Eshown in FIG. 3. FIGS. 7C to 7E depict details of a positioncorresponding to a section F in FIG. 7A. FIG. 7C is a plan view of astate of a surface layer (corresponding to an upper surface of thesurface D in FIG. 4). FIG. 7D is a plan view of a state of a surface C(corresponding to a surface C in FIG. 4; a third layer pattern and thirdlayer vias). FIG. 7E is a plan view of a state of the surface A(corresponding to the upper surface of the surface A in FIG. 4). FIG. 7Fis a plan view of another structure of the openings 50 on the multilayerdielectric substrate 2 and depicts another example of the details of thesection E shown in FIG. 3.

On the surface A (corresponding to the surface A in FIG. 4) shown inFIGS. 7A and 7E, the coupling opening 65 is formed in the inner-layergrounding conductor 35. The resistor 70 covers the coupling opening 65.The resistor 70 is not shown in FIG. 7E. FIG. 7A illustrates theinner-layer grounding conductor 35, the ground vias 30 on the insideconstituting the dielectric transmission line 80, and the ground vias 30d constituting the end short-circuited point of the dielectrictransmission line 80.

On the surface D (the surface layer) shown in FIGS. 7B and 7C, thegrounding conductor 18 is brazed along the inner circumference of theseal ring 4, and the seal ring 4 is bonded to the grounding conductor18. The surface layer inside the seal ring 4 is covered with thegrounding conductor 18. The opening 50 is formed at the end of thecavity 33 of the grounding conductor 18. The ground vias 30 are arrangednear the opening 50 in the grounding conductor 18 to form the impedancetransformer 60 in a direction of stacking substrates toward lowerlayers. The opening 50 is provided over the entire circumference of thecavity 33 along the inner circumference of the seal ring 4.

On the surface C (corresponding to the surface C in FIG. 4) shown inFIG. 7D, the ground vias 30 are arranged with dielectrics therebetween,and thereby constitute the impedance transformer 60.

FIG. 7F depicts another form of the openings 50. In this example, thegrounding conductor 18 is arranged at both ends of the openings 50 in adirection in which the openings 50 extend along the seal ring 4. Theopenings 50 are partially provided along the inner circumference of theseal ring 4. In this case, the openings 50 are arranged in positionsother than corner sections of the seal ring 4.

As shown in FIG. 7, the coupling openings 65, the resistors 70, and thedielectric transmission lines 80 are formed in four directions aroundthe IC mounting recess 6. Although not shown in the figure, the openings50 and the impedance transformers 60 are formed in four directionsaround the IC mounting recess 6 in the same manner. These components(the opening 50, the impedance transformer 60, the coupling opening 65,the resistors 70, and the dielectric transmission line 80) can becontinuously formed as shown in FIGS. 7A and 7B or can be formedseparately in a plurality of sections as shown in FIG. 7F. Thecomponents can be provided, according to the mode of resonance of anobject, on vertical or horizontal two sides, one vertical side and onehorizontal side, or one vertical side or one horizontal side rather thanon the entire inner circumference of the cavity 33 as shown in FIGS. 7Aand 7B.

It is desirable that the opening 50 be located at a position spacedapart a length an integer times as long as about ½ of a wavelength of asignal wave from the periphery of the inner wall section of the sealring 4 (the side end of the cavity 33) or the inner wall section of theseal ring 4 toward the center. This is to arrange, in waveguideconnection of the cavity 33 and the impedance transformer 60, theconnecting section, i.e., the opening 50, at a short-circuited point ofa standing wave formed in the cavity 33. In other words, the optimumposition of the opening 50 depends on a resonance mode of a signal banddetermined by dimensions of the seal ring 4, the cover 5, and the cavity33 formed by the grounding conductors 18 in the surface layer. It ismost effective to arrange the waveguide connecting section, i.e., theopening 50, at the short-circuited point of the standing wave generatedby resonance.

FIG. 8 is a graph of an isolation characteristic and the like in thecavity 33 according to the first embodiment. A solid line indicates anisolation characteristic according to the first embodiment, a brokenline indicates that of the conventional technology in which the openings50, the impedance transformers 60, the coupling openings 65, theresistors 70, and the dielectric transmission lines 80 according to thefirst embodiment are not provided, and an alternate long and shortdashed line indicates a characteristic of an open state without thecover 5.

With respect to a desired frequency f₀, the open state without the cover5 indicated by the alternate long and short dashed line is an idealstate in which there is no cavity resonance at frequencies of 0.8 f₀ to1.2 f₀ and a semiconductor device and a transmission line operatestably. In the conventional technology not having the constitutionaccording to the first embodiment, as indicated by the broken line,resonance of a high-order mode occurs and the isolation characteristicdeteriorates steeply in a plurality of frequency domains. On the otherhand, in the constitution according to the first embodiment indicated bythe solid line, in a signal frequency band, it is possible to obtain anisolation characteristic that there is no cavity resonance and asemiconductor device and a transmission line operate stably assubstantially the same in the state of the cover 5 being removed.

As described above, according to the first embodiment, impedance matchfrom the cavity 33 to the resistor 70 is realized by the opening 50 ofthe surface-layer grounding conductor and the impedance transformer 60.The resistor 70 is arranged in parallel to an electric field at an openpoint with the maximum electric field of the dielectric transmissionline 80, i.e., on the coupling opening 65. Thus, a terminating conditionwithout an electric wall is simulatively created in the signal frequencyband. Because of the terminating condition, a resonance mode iscontrolled as in the open state without the cover 5. An opening, adielectric transmission line, and a resistor can be formed togetherduring the manufacture of a multilayer dielectric substrate, whicheliminates the need for secondary assembly work. Thus, it is possible tosimplify manufacturing process, resulting in less cost. Moreover, anadhesive is not used in arranging the resistor, and an inert gas, whichcontaminates and erodes a high-frequency device, is not generated.

In the first embodiment, the length L2 of the dielectric transmissionline 80 can be set to a length an odd number times as long as λg/4.Similarly, the length L1 of the impedance transformer 60 can be set to alength an odd number times as long as λg/4. In the first embodiment, thelength of λg/4 of the dielectric transmission line 80 is set in thehorizontal direction of the multilayer dielectric substrate 2 to ensurethe length of λg/4 by one layer of the multilayer dielectric substrate2. However, the length of λg/4 can be set in the thickness direction ofthe multilayer dielectric substrate 2.

A structure of the dielectric transmission line 80 is not limited to therectangular dielectric waveguide formed in the vertical or thehorizontal direction as shown in the example in the figures. Thedielectric transmission line 80 can be a step-shaped dielectricwaveguide or the like with via positions in respective layers of adielectric substrate shifted from one another as long as the impedancerelation and the necessary electric length from the end short-circuitedposition are secured.

Second Embodiment

FIG. 9 is a diagram of a high-frequency package according to a secondembodiment. In the second embodiment, the impedance transformers 60 ofthe first embodiment are removed.

In FIG. 9, each of the openings 50, i.e., a pattern removed from aground, is formed at the cavity end of the ground pattern 18 as asurface-layer grounding conductor of the surface layer (the first layer)of the multilayer dielectric substrate 2 or the periphery of the end.The short-circuited-end dielectric transmission line 80 with a length ofabout ¼ of the in-substrate effective wavelength λg of a signal wave,which is electrically coupled with the cavity 33 via the opening 50, isformed in the multilayer dielectric substrate 2 beyond the opening 50.As in the first embodiment, the dielectric transmission line 80 includesthe inner-layer grounding conductor 35, the ground vias 30, anddielectrics in the inner-layer grounding conductor 35 and the groundvias 30.

However, in this case, a short-circuited point is formed by theinner-layer grounding conductor 35. The length λg/4 of the dielectrictransmission line 80 is a depth (thickness) L3 from the opening 50 tothe short-circuited-end inner-layer grounding conductor 35.

In the second embodiment, as in the first embodiment, a terminatingwaveguide coupled to the cavity 33 is formed to simulatively create astate equivalent to an open state without the cover 5. In the secondembodiment, as in the first embodiment, the opening 50 is located at anopen point with the maximum electric field and the resistor 70 isarranged in the opening 50 in parallel to an electric field formingsurface. Thus, in a signal frequency domain, a terminating conditionwithout an electric wall is simulatively created to suppress a resonancemode. An opening, a dielectric transmission line, and a resistor can beformed together during the manufacture of a multilayer dielectricsubstrate, which eliminates the need for secondary assembly work. Thus,it is possible to simplify manufacturing process, resulting in lesscost. Moreover, an adhesive is not used in arranging the resistor, andan inert gas, which contaminates and erodes a high-frequency device, isnot generated.

Third Embodiment

FIG. 10 is a diagram of a high-frequency package according to a thirdembodiment. In the third embodiment, a resistor is arranged in adirection of stacking layers of a dielectric substrate between theshort-circuited-end ground via 30 d and the coupling opening 65 of thefirst embodiment in the dielectric transmission line 80. In an exampleof FIG. 10, a resistor via array 300 filled with resistor material isarranged instead of a conductor.

In the third embodiment, a cavity-resonance control circuit includingthe opening 50, the impedance transformer 60, the coupling opening 65,the dielectric transmission line 80, and the resistor via array 300 isformed in the multilayer dielectric substrate 2.

Each of the openings 50, i.e., a pattern removed from a ground, isformed at the cavity end of the ground pattern 18 as a surface-layergrounding conductor of the surface layer (the first layer) of themultilayer dielectric substrate 2 or the periphery of the end. Theimpedance transformer 60 with a length of about ¼ of the in-substrateeffective wavelength λg of a signal wave, which is electrically coupledto the cavity 33 via the opening 50, is formed in the multilayerdielectric substrate 2 beyond the opening 50. The length about λg/4 ofthe impedance transformers 60 is, as shown in FIG. 10, the distance L3from the opening 50 to the coupling opening 65. The impedancetransformer 60 includes the inner-layer grounding conductor 35, theground vias 30, and dielectrics in the inner-layer grounding conductor35 and the ground vias 30.

Each of the coupling openings 65, i.e., a pattern removed from a ground,is formed in the inner-layer grounding conductor 35 arranged at aposition distant from the opening 50 by a length of about λg/4. Theshort-circuited-end dielectric transmission line 80 with an arbitrarylength (longer than about ¼ of the in-substrate effective wavelength λgof the signal wave) is formed beyond the coupling opening 65. Thedielectric transmission line 80 includes the inner-layer groundingconductor 35, the ground vias 30 and 30 d, and dielectrics in theinner-layer grounding conductor 35 and the ground vias 30.

In the third embodiment, the resistor via array 300 filled with resistormaterial is provided between the ground via 30 d forming an endshort-circuited surface and the coupling opening 65. As shown in FIG.10, the resistor via array 300 is arranged at a position distant by alength (L4) about ¼ of the in-substrate effective wavelength λg of thesignal wave from the ground via 30 d forming an end short-circuitedsurface in the dielectric transmission line 80. The position about λg/4from an end short-circuited point of the dielectric transmission line 80is, for the signal wave with the in-substrate effective wavelength λg,an open point where the electric field is maximized. Each of theresistor via arrays 300 is arranged at the open point in parallel to theelectric field formed in the dielectric transmission line 80.

In the third embodiment, as in the first and second embodiments, aterminating waveguide coupled to the cavity 33 is formed to simulativelycreate a state equivalent to an open state without the cover 5. In thethird embodiment, as in the first and second embodiments, impedancematch from the cavity 33 to the resistor via arrays 300 is realized bythe openings 50 of the surface-layer grounding conductors and theimpedance transformers 60. The resistor via array 300 is arranged inparallel to an electric field at an opening point with the maximumelectric field of the dielectric transmission line 80, i.e., on thecoupling opening 65. Thus, a terminating condition without an electricwall is simulatively created in the signal frequency band to suppress aresonance mode. An opening, a dielectric transmission line, and aresistor can be formed together during the manufacture of a multilayerdielectric substrate, which eliminates the need for secondary assemblywork. Thus, it is possible to simplify manufacturing process, resultingin less cost. Moreover, an adhesive is not used in arranging theresistor, an inert gas, which contaminates and erodes a high-frequencydevice, is not generated.

It is obvious that, in FIG. 10, as in the second embodiment, theimpedance transformers 60 can be removed. In the third embodiment, thelength L4 from the ground via 30 d forming an end short-circuitedsurface to the resistor via array 300 can be set to a length an oddnumber times as long as λg/4. Similarly, the length L3 of the impedancetransformer 60 can be set to a length an odd number times as long asλg/4. In the third embodiment, as in the first and second embodiments,the dielectric transmission line 80 can be formed in the thicknessdirection of the multilayer dielectric substrate 2.

In the embodiments described above, the present invention is applied tothe high-frequency package configured to house the high-frequencydevices 3 in the IC mounting recess 6 formed in the multilayerdielectric substrate 2. However, it is also possible to apply thepresent invention to a high-frequency package configured to mount thehigh-frequency devices 3 on a flat surface layer of the multilayerdielectric substrate 2 not having the IC mounting recess 6.

INDUSTRIAL APPLICABILITY

As described above, the multilayer dielectric substrate and thesemiconductor package according to the present invention are suitablyapplied to semiconductor electronic devices such as an FM-CW radar thatrequire measures against high-frequency electromagnetic interference(EMI).

1. A multilayer dielectric substrate that includes a cavity on adielectric substrate, and a semiconductor device in the cavity, thecavity being an electromagnetically shielded space, the multilayerdielectric substrate comprising: a grounding conductor that is a part ofthe electromagnetic shield, and covers substantially the entiredielectric substrate in the cavity; an opening that is located at a partof the grounding conductor; an impedance transformer that is located inthe dielectric substrate, electrically connected to the cavity throughthe opening, and has a length an odd number times as long as about ¼ ofan in-substrate effective wavelength of a signal wave; a dielectrictransmission line with an end short that is located in the dielectricsubstrate; a coupling opening that is located on an internal groundingconductor in a connecting section of the impedance transformer and thedielectric transmission line; and a resistor that is located at aposition in the dielectric transmission line distant from the end shortby a length an odd number times as long as about ¼ of the in-substrateeffective wavelength of the signal wave.
 2. A multilayer dielectricsubstrate that includes a cavity on a dielectric substrate, and asemiconductor device in the cavity, the cavity being anelectromagnetically shielded space, the multilayer dielectric substratecomprising: a grounding conductor that is a part of the electromagneticshield, and covers substantially the entire dielectric substrate in thecavity; an opening that is located at a part of the grounding conductor;a dielectric transmission line with an end short that is located in thedielectric substrate, electrically connected to the cavity through theopening, and has a length an odd number times as long as about ¼ of anin-substrate effective wavelength of a signal wave; and a resistor thatis located on the opening.
 3. A multilayer dielectric substrate thatincludes a cavity on a dielectric substrate, and a semiconductor devicein the cavity, the cavity being an electromagnetically shielded space,the multilayer dielectric substrate comprising: a grounding conductorthat is a part of the electromagnetic shield, and covers substantiallythe entire dielectric substrate in the cavity; an opening that islocated at a part of the grounding conductor; a dielectric transmissionline with an end short that is located in the dielectric substrate, andelectrically connected to the cavity through the opening; and a resistorthat is located at a position in the dielectric transmission linedistant from the short-circuited end by a length an odd number times aslong as about ¼ of an in-substrate effective wavelength of a signalwave.
 4. The multilayer dielectric substrate according to claim 1,wherein the opening is located at any one of a side end of the cavityand a position distant from the side end by a length an integer times aslong as about ½ of a wavelength of the signal wave.
 5. The multilayerdielectric substrate according to claim 2, wherein the opening islocated at any one of a side end of the cavity and a position distantfrom the side end by a length an integer times as long as about ½ of awavelength of the signal wave.
 6. The multilayer dielectric substrateaccording to claim 3, wherein the opening is located at any one of aside end of the cavity and a position distant from the side end by alength an integer times as long as about ½ of a wavelength of the signalwave.
 7. The multilayer dielectric substrate according to claim 2,wherein the opening, the dielectric transmission line, and the resistorare located around where the semiconductor device is mounted.
 8. Themultilayer dielectric substrate according to claim 3, wherein theopening, the dielectric transmission line, and the resistor are locatedaround where the semiconductor device is mounted.
 9. The multilayerdielectric substrate according to claim 1, wherein the opening, theimpedance transformer, the dielectric transmission line, the couplingopening, and the resistor are located around where the semiconductordevice is mounted.
 10. The multilayer dielectric substrate according toclaim 1, wherein the dielectric transmission line includes the internalgrounding conductor, a plurality of ground via-holes, and dielectrics inthe internal grounding conductor and the ground via-holes.
 11. Themultilayer dielectric substrate according to claim 2, wherein thedielectric transmission line includes the internal grounding conductor,a plurality of ground via-holes, and dielectrics in the internalgrounding conductor and the ground via-holes.
 12. The multilayerdielectric substrate according to claim 3, wherein the dielectrictransmission line includes the internal grounding conductor, a pluralityof ground via-holes, and dielectrics in the internal grounding conductorand the ground via-holes.
 13. The multilayer dielectric substrateaccording to claim 1, wherein the impedance transformer includes theinternal grounding conductor, a plurality of ground via-holes, anddielectrics in the internal grounding conductor and the groundvia-holes.
 14. A semiconductor package comprising: the multilayerdielectric substrate according to claim 1; and an electromagneticshielding member that forms the cavity.
 15. A semiconductor packagecomprising: the multilayer dielectric substrate according to claim 2;and an electromagnetic shielding member that forms the cavity.
 16. Asemiconductor package comprising: the multilayer dielectric substrateaccording to claim 3; and an electromagnetic shielding member that formsthe cavity.
 17. A semiconductor package comprising: a semiconductordevice; the multilayer dielectric substrate according to claim 1 thatincludes thereon the semiconductor device; and an electromagneticshielding member that forms the cavity for housing the semiconductordevice.
 18. A semiconductor package comprising: a semiconductor device;the multilayer dielectric substrate according to claim 2 that includesthereon the semiconductor device; and an electromagnetic shieldingmember that forms the cavity for housing the semiconductor device.
 19. Asemiconductor package comprising: a semiconductor device; the multilayerdielectric substrate according to claim 3 that includes thereon thesemiconductor device; and an electromagnetic shielding member that formsthe cavity for housing the semiconductor device.